Tantalum target

Tantalum (element symbol Ta) is a rare and refractory metal with excellent performance, with a melting point of up to 2996 ℃ and a density of 16.65 g/cm ³.

BrandTa

StandardYS/T 751/ASTM B708

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Product Introduction

Tantalum (element symbol Ta) is a rare and refractory metal with excellent performance, with a melting point of up to 2996 ℃ and a density of 16.65 g/cm ³. It combines the characteristics of high density and low thermal expansion coefficient. Its core advantage lies in its strong corrosion resistance, which can resist the corrosion of most chemical media such as hydrochloric acid, sulfuric acid, nitric acid, etc. at room temperature. Only a few substances such as fluoride and concentrated alkali can affect it, and this characteristic is comparable to precious metals. At the same time, tantalum has excellent ductility and weldability, making it easy to process even at low temperatures of -200 ℃ and capable of producing complex shaped components.
In key application areas, tantalum exhibits irreplaceability: as an anode material for capacitors, the dense oxide layer formed by it gives tantalum capacitors the advantages of large capacity, small size, and high reliability, accounting for more than two-thirds of the global tantalum usage and widely used in electronics, automotive, and defense equipment; In the medical field, tantalum is known as a "metalloid" due to its good biocompatibility. The elastic modulus of porous tantalum is suitable for human bones and can be used to make joint prostheses, bone repair patches, and surgical sutures. After implantation, it can promote tissue growth without rejection reactions; In industrial settings, tantalum can be used in chemical reactors, semiconductor ion implantation machine parts, and aerospace alloy components, withstanding extreme temperatures and corrosive environments.

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